PLSP Plasma Spectrometer


The PPD deposition is characterized by a dense plasma ejected from the target. The relative intensity of the lines are a fingerprint of the deposition process. The OS Plasma Spectrometer (OS-PLSP1) is designed to take the c.w. in-situ spectrum during deposition. The OS-PLSP1 is based on a OEM CCD spectrometer with a sufficient resolution vs sensitivity for the monitoring of the plasma composition during growth.
The proprietary software allows to monitor the time evolution of the plasma intensity and composition during growth by monitoring the relative intensities of selected emission lines. Relative intensities of chosen plasma emission lines is performed continuously. Data are automatically stored in a data logger for subsequent deposition conditions inspection. The laser wavelenght may be chosen among 405, 632.8 and 530 nm for convenience depending on the materials to be grown. The OS-PLSP1 is also suitable for plasma based growth techniques (i.e. sputtering, plasma spray, and particularly for pulsed laser deposition - PLD).


Operation in situ
Port Mount UHV DN40CF
Resolution 0.8nm
Spectral Range (nm) 200-800
Operating Software Windows XP or more recent

The image shows the PLSP typical screen window. At the top is shown the actual plasma emission spectrum of the plume generated by PPD ablation of a sinc oxide (ZnO) target.
Ionized and atomic bands of Zn are the intense lines between 460 and 500nm.
The actual relative intensity of an ionized and an atomic Zn line is shown in the bottom right hand display and the dependence of the relative intensity during the time span of the deposition is shown in the lower center graph.