GEN IV
PPD Gun Series
The OS PPD GEN SERIES 3000 Electron/Plasma Source is the fourth generation of sources designed by OS with improved performances in terms of repetition rate, efficiency, roughness.
Download the PPD video (WMV 4.6 MB)
Characteristics
| Rugged construction | stainless steel (SS304) and glass |
|---|---|
| Small geometrical form factor | 63mm diameter, suitable for parallel close packing PPD sources |
| Adjustable cathode gas inlet flow | permits variable operating pressures (see below) |
| Replaceable capillary for extended lifetime | PPD-CT series (available from stock) |
| z-adjustable position in the deposition chamber | 250mm |
| Compact electronic design | |
| Indipendent triggering system | |
| Bakeable | up to 200°C |
| Low electromagnetic noise | |
| Two or more PPD Guns can be syncronized | |
| No moving parts |
Specifications
| Max. rep. rate | 100 Hz | |
|---|---|---|
| Beam cross section | 3÷12 mm2 | according to capillary dimension |
| Mean electron energy | 2KeV | |
| Max. electron energy | 20 KeV | |
| Pulse power density | 4÷600 MW/cm2 | |
| Max. pulse energy | > 4 J | |
| Min. Pulse energy | < 0.1 J | |
| Cathode lifetime | 5x109 shots | |
| Operating voltage | 8÷25 KV | |
| HV power supply | 0÷25 KV, 50mA | |
| Ablation depth | 0.5÷2 µm | depending on the material |
| Deposition rate | 100÷2000 angstrom/minute | depending on the material |
| Efficiency | > 60% | input power (capacitors) vs output power (beam) |
| Input voltage | 115÷230 VAC, 50/60 Hz | single phase |
| Deposition operating pressure | 2X10-2 ÷ 2x10-5 mbar | |
| Mounting | UHV DN63CF flange | |
| z alignement range | 250 mm | optional |
| Data logger | Y | (voltage, pressure) |
| in-situ Deposition rate | Y | LTM-XXX (optional) |
| in-situ Spectrum analyzer | Y | PLSP (optional) |
PPD-Gun
