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    • GEN IV
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Characteristics

Working pressure	up to 10-10 mbar effusion cell for organic materials complete with controller MA2 consisting of :
Standard DN35CF flange mounting
Boron Nitride cylindrical uniform heating element SS external body
Total height:	249mm
Externally operated shutter connection
Cell dimension:	114mm height, 35mm diameter
Cylindrical changeable quartz (SiO2 crucible
Crucible capacity:	0.35cm3
Patented Tantalum wire heater for uniform deposition rate
Multiple Tantalum foil heat shielding
Max working temperature	800°C
Max out-gassing temperature	900°C
Type K thermocouple with feed-through
Water cooling system
Temperature stability	up to 0.1%
V out	max 10V
V in 220V	50-60Hz
Max DC current	4A