GEN III Standard

PPD Gun Series

The OS PPD Gen III standard Gun (PPD-III) is a rugged pulsed electron/plasma source in operation since 2007. It is mounted on a variety of systems with one and more sources. It allows simple operation and requires low maintenance costs. Max rep. rate 15Hz.


Rugged construction stainless steel (SS304) and glass
Small geometrical form factor 63mm diameter, (DN63CF) suitable for parallel close packing of PPD sources
Adjustable cathode gas inlet flow permits variable operating pressures (see below)
Replaceable capillary for extended lifetime PPD-CT series (available from stock)
z-adjustable position in the deposition chamber 50mm
Compact electronic design
Indipendent triggering system
Bakeable up to 150°C in the deposition chamber
Low electromagnetic noise
Two or more PPD Guns can be syncronized


Max. rep. rate 15 Hz
Beam cross section 3÷12 mm2 according to capillary dimension
Mean electron energy 2KeV
Max. electron energy 20 KeV
Pulse power density 4÷300 MW/cm2
Max. pulse energy > 2 J
Min. Pulse energy < 0.1 J
Cathode lifetime 5x109 shots
Operating voltage 8÷25 KV
HV power supply 0÷25 KV, 10mA
Ablation depth 0.5÷2 µm depending on the material
Deposition rate 100÷1000 angstrom/minute depending on the material
Efficiency > 30% input power (capacitors) vs output power (beam)
Input voltage 115÷230 VAC, 50/60 Hz single phase
Deposition operating pressure 5X10-3 ÷ 2x10-5 mbar
Mounting UHV DN63CF flange
z alignement range 50 mm optional
Data logger Y (voltage, pressure)
in-situ Deposition rate Y LTM-XXX (optional)
in-situ Spectrum analyzer Y PLSP (optional)